Clean Tunnel Furnace for Semiconductor Industry

The Clean Tunnel Furnace for Semiconductor Industry is a heating and handling equipment designed specifically for the semiconductor manufacturing process. It combines high-temperature processing with the requirements of a highly clean environment to meet the stringent standards of cleanliness and precision control in the production of semiconductor chips.

Equipment Features

1. Heating system: far-infrared heating, high radiation effect, faster heating speed, heating tube distribution is reasonable, each temperature zone independent control, according to the process needs of the heating section temperature

2. Temperature control system: PLC + solving touch screen control, using pulse output control heater, SSR, to avoid instantaneous current impact, temperature control fluctuations and other impacts, with DC24V output thermostat, which can make the output voltage smooth output, temperature control effect is more stable, the temperature is more accurate, with PID self-tuning, automatic thermostat, automatic timing can be more than the set value of the temperature, the automatic cutting off of the heating When the temperature exceeds the set value, it will automatically cut off the heating power and sound and light alarm.

3. Equipment insulation: 100K encrypted aluminum silicate rock wool insulation, the box outside the basic to maintain the normal temperature of the room, the ambient temperature has less impact.

4. Safety protection: leakage protection, line protection, short circuit protection, overload protection, over-temperature protection.

5. According to the production needs can be equipped with high-temperature resistant high efficiency filter, clean grade CLASS1000.

6. Conveying: Teflon mesh belt, stainless steel mesh belt or plate chain conveying can be selected according to the need, and the conveying speed can be adjusted by frequency conversion.

7. The interior of the furnace body is made of SUS304# stainless steel plate to keep clean inside the furnace, and the surface of the equipment is treated with baking paint.

8. Support product code tracing and MES system (optional).

Benefits

1.Enhanced Product Quality: By maintaining a clean environment and precise thermal control, the Clean Tunnel Furnace contributes to the production of high-quality semiconductor devices with reduced defect rates.

2.Increased Yield: Improved processing conditions lead to higher yields, maximizing productivity and minimizing waste during manufacturing.

3.Energy Efficiency: Advanced heating technologies and precise control systems optimize energy usage, making the Clean Tunnel Furnace a cost-effective solution for semiconductor manufacturers.

Applications

Clean Tunnel Furnace is widely used in the semiconductor manufacturing industry, especially in the chip manufacturing, packaging and testing and other key links. It plays an important role in improving the yield of semiconductor chips, reducing production costs and shortening the production cycle.

Parameters

FAQ

What is a Clean Tunnel Furnace?

A Clean Tunnel Furnace is a specialized thermal processing tool designed for the semiconductor industry. It is used for various applications such as oxidation, diffusion, and annealing of semiconductor wafers while maintaining ultra-clean conditions to minimize contamination.

Why is cleanliness important in semiconductor manufacturing?

Cleanliness is crucial in semiconductor manufacturing because contaminants can lead to defects in semiconductor devices, affecting their performance and reliability. Even microscopic particles can disrupt the manufacturing process and compromise the quality of the final product.

How does the Clean Tunnel Furnace ensure a clean environment?

The Clean Tunnel Furnace employs advanced cleanroom technology, including HEPA filters and laminar flow systems, to filter out airborne particles. The controlled airflow and positive pressure help maintain a clean atmosphere inside the furnace.

What types of thermal processes can be performed in a Clean Tunnel Furnace?

The Clean Tunnel Furnace can perform several thermal processes, including:

• Oxidation

• Diffusion

• Annealing

• Doping

• Surface treatment for semiconductor wafers and thin films.

How does the furnace achieve precise temperature control?

The Clean Tunnel Furnace is equipped with advanced temperature control systems, such as PID controllers and thermocouples, to monitor and adjust the temperature accurately. This precision is essential for ensuring uniform processing and avoiding thermal gradients that can cause defects.

What advantages does inert gas atmosphere provide during processing?

Operating in an inert gas atmosphere, such as nitrogen or argon, prevents oxidation and contamination of the semiconductor materials during thermal processes. This is particularly important for sensitive materials that can degrade or react with oxygen.

How does the design of a Clean Tunnel Furnace facilitate scalability?

Many Clean Tunnel Furnaces feature a modular design that allows for customization based on specific production requirements. This modularity enables manufacturers to adapt the furnace to accommodate different substrate sizes and production volumes, making it scalable for various applications.

What role does automation play in the operation of a Clean Tunnel Furnace?

Automation in a Clean Tunnel Furnace enhances operational efficiency by allowing precise control over processing parameters, such as temperature, gas flow, and time. This automation reduces the potential for human error, improves reproducibility, and enables integration with larger manufacturing systems.

What impact does a Clean Tunnel Furnace have on product yield?

By providing optimal processing conditions and maintaining cleanliness, the Clean Tunnel Furnace significantly improves product yield. Higher yields mean fewer defects and less waste, leading to increased productivity and cost-effectiveness in semiconductor manufacturing.

What are the future trends for Clean Tunnel Furnaces in the semiconductor industry?

Future trends for Clean Tunnel Furnaces may include advancements in automation and AI integration for process optimization, increased energy efficiency, enhanced monitoring systems for real-time data analysis, and further improvements in maintaining ultra-clean environments to support the development of next-generation semiconductor devices.